| abstract |
(57) [Summary] (Correction) [Purpose] To provide an electronic component having highly reliable metal wiring. [Structure] An amorphous thin film 3 formed on a substrate 1 and a metal wiring 2 formed on the surface of the amorphous thin film are provided, and a peak of a halo pattern appearing in a diffraction measurement of the amorphous thin film 3 is formed. It is characterized in that the corresponding interatomic distance and the interplanar spacing of a predetermined crystal plane defined by the first interatomic distance of the metal wiring 2 are substantially matched. |