| abstract |
(57) [Summary] [Position] A positive photoresist composition obtained by dissolving an alkali-soluble resin and a quinonediazide group-containing compound in a β-type propylene glycol monoalkyl ether acetate solvent alone or in an organic solvent containing the solvent as a main component. Is. [Effects] The above composition is free from precipitation of a photosensitive component of photoresist, has excellent storage stability, can form a resist pattern having an excellent profile shape, and is extremely safe, particularly in the field of semiconductor device manufacturing. Effectively used in. |