http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06313135-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f09378c018e7719f171f7e91f2dd60fd |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D201-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1993-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_621dddfce20fc9283ea2f34d75cb4db3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e266f4cb3b8de826114f79c58113b74 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26221f9ff26e6b032fdc480e61616fe5 |
| publicationDate | 1994-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06313135-A |
| titleOfInvention | Positive electrodeposition photoresist composition and method for producing resist pattern |
| abstract | (57) [Summary] [Object] To provide a positive electrodeposition photoresist composition having high resolution and excellent fine image pattern forming ability, and a method for producing a pattern using the same. [Structure] A) 0.5 to 10 equivalents of a carboxyl group and 1.0 of a hydroxyphenyl group per 1 kg of the polymer. 100 parts by weight of a polymer containing an equivalent amount or more, B) 5 to 150 parts by weight of a compound containing at least two vinyl ether groups in one molecule, and C) a compound that generates an acid upon irradiation with active energy rays. ) And B) total 1 A positive electrodeposition photoresist composition characterized by neutralizing a composition containing 0.1 to 40 parts by weight with respect to 00 parts by weight as a basic component with a basic compound, and dissolving or dispersing the same in water. A method for manufacturing a resist pattern using. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6884570-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6555286-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6670100-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6187509-B1 |
| priorityDate | 1993-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.