| abstract |
(57) [Summary] (Modified) [Structure] Tetracarboxylic dianhydride, diamine, and general formula (1) H 2 N—R 1 —SiR 2 3-k X k (1) {here R 1 is — (CH 2 ) 5 — and the like, (s is 1 to 4 Integer. ), R 2 represents an alkyl group having 1 to 6 carbon atoms, X represents a hydrolyzable alkoxy group, and 1 ≦ k ≦ 3. } A silicon-containing polyimide precursor (a) obtained from an aminosilicon compound represented by the formula (a), a silicon-containing polyamic acid ester (b) obtained by esterifying the (a) with a monovalent saturated alcohol, and (a) are further added. Containing at least one polyimide precursor selected from the group consisting of partially esterified silicon-containing polyamic acid ester (c) obtained by partial esterification with divalent saturated alcohol, and a compound capable of generating an acid upon irradiation with light A photosensitive resin composition comprising: [Effect] A clear negative relief pattern can be formed, the film loss during curing by baking is small, and the adhesion to the substrate is excellent. |