| abstract |
(57) [Summary] (Modified) [Structure] A mole of a tetracarboxylic acid derivative of Of diamine B Obtained by reacting C mol of aminosilicon compound of And in N-methyl-2-pyrrolidone A silicone-containing polyamic acid derivative having a logarithmic viscosity number at 0.1 ° C. of 0.1 to 5 dl / g. {R 1 is a tetravalent organic group, R 2 R 5 is an alkyl group or the like, R 3 is a polysiloxane group or the like, R 4 is a phenylene or the like, X is a hydrolyzable alkoxy group, and Z is Is Or the like (where 1 ≦ k ≦ 3). } [Effect] The above-mentioned silicon-containing polyamic acid derivative and the photosensitive resin composition using the same can form a negative negative clear relief pattern, little film loss upon curing by baking, adhesion to a substrate, and heat resistance. Excellent stability and storage stability. |