http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06282080-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate | 1993-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e770a325fbffe928f1b357dae023146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61d6ec65b8239251976fb14627d975ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47a01e1e09cae5bf3b9053769fd27769 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e978c73728e838b8f570e3b4153d016f |
| publicationDate | 1994-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06282080-A |
| titleOfInvention | Alkaline developer for radiation-sensitive composition |
| abstract | (57) [Summary] [Effect] The present invention dissolves and removes an alkali-soluble portion of a coating film formed from a radiation-sensitive composition when producing a resist pattern or a color filter using the radiation-sensitive composition. A resist pattern or color filter having sharp pattern edges can be stably formed on a large number of sheets over a long period of time and can be prepared as a high-concentration developing solution. An alkaline developer for a radiation-sensitive composition is provided. [Structure] The alkaline developer for radiation-sensitive composition according to the present invention comprises: [A] an alkaline compound having a pH of 10 or more in a 0.1 wt% aqueous solution, [B] a dipole ionic organic compound and [C] anion. At least one surfactant selected from the group consisting of a cationic surfactant, a cationic surfactant and a nonionic surfactant is dissolved in water. As this surfactant, a nonionic surfactant is preferable. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8053180-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7794924-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100483371-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7427168-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100840530-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7857530-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20000073787-A |
| priorityDate | 1993-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 92.