http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06279946-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_646018b7183a929bbb6e26dcdb62a8da |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C38-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C21D9-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C38-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C21D8-02 |
filingDate | 1993-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90c4eeda1b93d293cce17c15528a9c17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11a31e4d2db37e72b37974317716a30a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53807124eec6a001048d0c0cfd596537 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6518dcda8cb5c1257862c71c4df12c6 |
publicationDate | 1994-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H06279946-A |
titleOfInvention | Shadow mask material excellent in etching property, intermediate material thereof, manufacturing method thereof, shadow mask manufacturing method, and cathode ray tube |
abstract | (57) [Summary] [Object] To provide a high-definition shadow mask material having a good etching perforation property and a method for producing the same. [Structure] {100} orientation integration of rolling surface is 85% or more, and A shadow mask material having a fibrous rolled structure in a cross section perpendicular to the plate width direction, an etching for forming an electron passage opening, and a surface roughness Ra of the etched surface is 0.6 μm. Shadow mask material that is less than or equal to m, the same degree of integration as above, and an average aspect ratio of crystal grains of 3 or more with the same speculum. And a shadow mask material with a Vickers hardness HV of 130 or more, an intermediate material for a shadow mask material with a change in the degree of {100} orientation integration of 30% or less before and after final annealing at 850 ° C or less, and 8 Performing annealing of 5% or more cold rolling and 700 ° C or more, a method for producing a shadow mask material, in which cold rolling with a rolling ratio not exceeding the rolling ratio of the cold rolling and annealing at a temperature not exceeding 850 ° C are performed, And a cathode ray tube using the above material. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190042659-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100391911-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014101543-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170038671-A |
priorityDate | 1992-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.