http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0627668-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5029 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B41-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1992-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31128112328d697e0b00e4128836356d |
| publicationDate | 1994-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0627668-A |
| titleOfInvention | Ionizing radiation sensitive negative resist |
| abstract | (57) [Summary] [Purpose] To obtain high sensitivity and high resolution resist. [Structure] Polyion complex formation between a monomer that produces an anion or cation upon exposure to ionizing radiation and a cationic or anionic polymer, or polyion between a polymer having a site producing an anion or cation and a cationic or anionic monomer By forming a complex or a polyion complex of a polymer having a site generating anions or cations and a monomer having a site generating cations or anions, a pattern is formed on a negative resist due to a difference in dissolution rate between an exposed portion and an unexposed portion. Form. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6387598-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6387592-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6376154-B2 |
| priorityDate | 1992-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.