| abstract |
(57) [Summary] [Purpose] Along with supplying a photoresist layer that is excellent in the dispersion stability of the phosphor at all times without causing poor dispersion of the phosphor, To provide a photoresist film which forms a cured resist layer having a thickness of 0 μ or more and is excellent in pattern formation accuracy. [Structure] A photoresist film in which a photosensitive resin composition containing a phosphor is laminated on a base film. |