http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06236020-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b5886f41dcde897cf6f14c4787408a6d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 1992-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fee88d300e666aadb5b4a5347bccbaf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da8f19d1bb6284fc76f1e74de6119583 |
| publicationDate | 1994-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06236020-A |
| titleOfInvention | System for recording data patterns on a flat substrate |
| abstract | (57) [Summary] (Modified) [Objective] To provide a rapid and low-process method for generating a photographic tool used in the semiconductor industry. A photolithography-free photographic means generator uses a pulsed excimer laser to create an image of the deformable mirror spatial light modulator 1 onto a thin ablatable coating on a quartz substrate 9. The light pulses ablate and clear the coating from selected areas according to the data pattern in the deformable mirror array. Exposure uniformity is enhanced by a two-dimensional overwriting method. This high image reduction rate does not exceed the allowable energy density on the deformable mirror array substrate 9 Allows high energy density above. The record is photolithographic free (ie no development is required) So, the generated image can be verified immediately after writing. The last feature has particular importance with respect to phase shift masks. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002072491-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004074934-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006018228-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7474383-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H09108881-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004264337-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004245905-A |
| priorityDate | 1992-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.