http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06230566-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ac17835c97e6c72213815ca74845386 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1993-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c1aa707210d942a2a8b8458ead290ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6533877ee20e20f9acccead6df3322a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaab277e3f613529728116a80bd26f35 |
| publicationDate | 1994-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06230566-A |
| titleOfInvention | Positive photosensitive resin composition |
| abstract | (57) [Summary] [Object] The present invention provides a positive photosensitive resin composition having high exposure sensitivity, suppressing swelling or dissolution of unexposed areas during development, and maintaining other properties. . The present invention is a resin obtained by the reaction of a specific polyepoxide compound, a carboxylic acid compound having a specific phenolic hydroxyl group, a carboxylic acid compound having no specific phenolic hydroxyl group, and a 1,2-quinonediazide sulfonic acid halide compound. Provided is a positive photosensitive resin composition containing |
| priorityDate | 1993-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 373.