http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06220561-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_283a2b2a3dad59382bb9ab870324effb
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G9-04
filingDate 1993-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b082d63f26a9e226c7108600e371b1ff
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cdd950ba66552432f090e1dc3119a238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a8d3763db6814139487d3dd5d07725c
publicationDate 1994-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06220561-A
titleOfInvention Aluminum alloy foil for electrolytic capacitors with high bending strength after etching
abstract (57) [Summary] [Constitution] Si 100ppm or less, Fe 100ppm or less, Cu Aluminum foil for electrolytic capacitors, which contains 5 to 60 ppm, Ti 0.1 to 1 ppm and V 0.5 to 5 ppm, and which has a balance of 99.96% by weight or more of Al and unavoidable impurities and has a high bending strength after etching. B can be included as a selection component. [Effect] An excellent capacitance is obtained by etching treatment, especially AC etching, and bending strength after etching is high.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103563028-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002097528-A
priorityDate 1993-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.