| abstract |
(57) [Summary] (Modified) [Objective] To provide a radiation-sensitive resin composition useful as a resist, which is particularly excellent in pattern shape and is also excellent in sensitivity, resolution, performance stability, storage stability and the like. [Structure] The radiation-sensitive resin composition is characterized by containing a 1,2-naphthoquinonediazide-4-sulfonic acid ester component represented by the following formula (1). (Here, D represents a hydrogen atom or a 1,2-naphthoquinonediazide-4-sulfonyl group, but at least one of D is a 1,2-naphthoquinonediazide-4-sulfonyl group, and each R is a mutual group. May be the same or different and each represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms, and m, n, x and y are each 0 to It is an integer of 5, but 5 ≦ m + n ≦ 10, m + x = 5, n The relationship of + y = 5 is satisfied. ) |