http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06199532-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb5143c5d291d49c700ac1631bdd20df
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2203-22
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1415
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B37-01413
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B37-014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B8-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06
filingDate 1991-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64ad5b0609e6acaeeaebb8eac9dec110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd1353b25546d5e83e50067324cd5783
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad8695c73f59e9101d182ce702a26e81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01fc05303e7f924c6b3812a44457362d
publicationDate 1994-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06199532-A
titleOfInvention Method for manufacturing quartz glass member for excimer laser
abstract (57) [Summary] [Purpose] It is possible to reduce the amount of paramagnetic defects generated during excimer laser irradiation. [Constitution] In the direct flame hydrolysis method, as a raw material, An alkoxysilane compound having the chemical formula R 1 n Si (OR 2 ) 4-n (wherein R 1 and R 2 are the same or different aliphatic monovalent hydrocarbon groups, and n is an integer of 0 to 3) is used. To produce quartz glass.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8650912-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008239441-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7232778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1462717-A2
priorityDate 1991-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0280343-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6090836-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H04270130-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01138145-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0264645-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544408
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14456
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419596818
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415835757
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID137466
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516

Total number of triples: 48.