| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2175de8bcadd3c1447a15ba8b57051c6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
1993-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a27703da85772ac6e692e2fa1b2a177
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39e117007aa4231f815d1ca1c4ce63b3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15ddea6ab83bb416c93e05e9e7ea5603 |
| publicationDate |
1994-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H06194836-A |
| titleOfInvention |
Photoresist composition and pattern forming method using the same |
| abstract |
(57) [Summary] (Modified) [Purpose] Not only is it possible to obtain a resist pattern having a good profile up to 0.25 μm, but the linearity of the pattern is maintained up to 0.25 μm, A fine pattern and a pattern having a larger size are simultaneously formed. ## STR1 ## Formula I Novolac resins and formula II After forming a resist layer by applying a photoresist composition containing a polyvinyl phenol resin on a semiconductor wafer, the resist layer is selectively exposed using a photomask to silylate at least a part of the resist layer surface. To form a silylated resist layer, the unsilylated resist except the resist under the silylated resist layer is removed to form a resist pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102478762-A |
| priorityDate |
1992-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |