| abstract |
(57) [Abstract] [Purpose] To provide a pattern forming material having a wide exposure latitude and a small change in pattern dimension with respect to a change in exposure amount. [Structure] (A) a compound that generates an acid upon irradiation with actinic radiation, (B) a compound that generates a base or increases basicity upon irradiation with actinic radiation, and (C) a compound having at least one bond cleavable by an acid , And / or (D) a compound that is insoluble in water but soluble in an aqueous alkaline solution, A material for pattern formation, comprising: |