http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06194829-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1993-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_273d8650c2c2f123e39c9e8d9c3119a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e894e6a63f5bdb743ef7beddc23c5eda http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f7dd25f28318bbb719403b5297fe6fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 |
| publicationDate | 1994-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06194829-A |
| titleOfInvention | Positive photosensitive resin composition |
| abstract | (57) [Summary] [Structure] Alkali-soluble novolac type resin has the following general formula as a photosensitive component. Or [Chemical 2] (At least one of R 1 and R 2 in the formula is -OD. 3 , the rest are hydrogen atoms or hydroxyl groups, D 1 , D 2 and D 3 At least one of them is naphthoquinone-1,2- A positive photosensitive resin composition comprising a compound represented by a diazide sulfonyl group, the rest being hydrogen atoms, k, m and n being 0 or an integer of 1 to 3). [Effects] Since it is possible to form a resist pattern having high sensitivity, excellent image contrast, and excellent cross-sectional shape of the pattern, and particularly excellent depth of focus width characteristics and heat resistance, it is possible to form an IC or L It is preferably used as a resist for ultrafine processing of semiconductor devices such as SI. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5843616-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111742260-A |
| priorityDate | 1992-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 136.