http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06180299-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-12
filingDate 1992-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b0bfd4952635c5fc07dd3a37194ea32
publicationDate 1994-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06180299-A
titleOfInvention Thin film gas sensor and manufacturing method thereof
abstract (57) [Abstract] [Purpose] To obtain a thin film gas sensor with excellent sensitivity. [Structure] A gas sensitive layer 4 made of a metal oxide semiconductor and a sensitizing oxide solid-dissolved in a metal oxide semiconductor is formed on a substrate 1. The gas sensitive layer 4 is formed by the plasma controlled sputtering method.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007240462-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100483180-B1
priorityDate 1992-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.