http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06176734-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d54718aa1aadc75bbe0398c494d869e |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J43-24 |
filingDate | 1991-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e867f449236fe61231fed5261c829006 |
publicationDate | 1994-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H06176734-A |
titleOfInvention | Electron multiplier |
abstract | (57) [Summary] (Modified) [Purpose] Supplying low-priced electron multipliers by using a structure and manufacturing method that apply semiconductor microfabrication technology with excellent mass productivity to manufacture electron multipliers. To enable. [Structure] After transferring and developing one or more fine figures by a light exposure method or an electron beam exposure method, a mask is formed on one or both sides of a substrate 1 having an opening corresponding to the figures by etching, Micropores 2 penetrating the front and back of the substrate by etching using a liquid chemical or plasma gas using this, or ion beam etching, or a combination thereof. An electron multiplication element manufactured by forming a secondary electron multiplication film 3 on the inner wall of the substrate by a chemical vapor deposition method. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100873634-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008508693-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012533860-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103168339-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103168339-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000206252-A |
priorityDate | 1991-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.