http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06160335-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-41
filingDate 1992-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c86219fed4fdd4ee971d19bbfb442f8
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publicationDate 1994-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06160335-A
titleOfInvention Method of manufacturing limiting current type oxygen sensor
abstract (57) [Abstract] [Purpose] It is an object of the present invention to provide a method for manufacturing a thin film type limiting current oxygen sensor capable of obtaining excellent limiting current characteristics. [Structure] ZrO as an ion conductor film is formed on a substrate 11. A 2-Y2 O3 film 12 is formed, a Pt anode electrode 13 and a Pt cathode electrode 14 are formed thereon, and then a gas diffusion layer 15 is formed so as to cover the cathode electrode 14. The gas diffusion layer 15 is formed as a porous insulating ceramic film by printing and firing a mixed paste of silicon nitride powder and polysilazane which is a raw material polymer thereof.
priorityDate 1992-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 20.