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filingDate 1993-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce6b7aa49c235f30c94a218c81fa6e7e
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publicationDate 1994-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06157243-A
titleOfInvention Skin cleansing composition
abstract (57) [Summary] [Structure] A cosmetic composition suitable for topical application to human skin or hair, particularly for use as a makeup remover, comprising a second or fourth ethylene oxide number 4-12. At least one branched-chain nonionic alcohol ethylene oxide condensation surfactant or at least one second or branched-chain nonionic alcohol ethylene oxide / propylene oxide condensation surfactant having a propylene oxide condensation number of 1 to 6 and an ethylene oxide condensation number of 4 to 20. The nonionic surfactant has an average HLB value of about 10 to about 14, particularly about 10.5 to about 14, and together with the nonionic surfactant, preferably selected from monoalkyl phosphates and / or dialkyl phosphates and the like. A cosmetic composition which also comprises one or more hypoallergenic anionic surfactants. [Effect] Very low irritation and high makeup removing effect.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6169060-B1
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