| abstract |
(57) [Abstract] [Purpose] To provide a thin film forming method capable of forming a good quality Al-based alloy film as a conductor with good controllability. [Composition] Alkyl aluminum hydride gas, An aluminum alloy film is formed on a semiconductor substrate by a chemical vapor deposition method using a gas of an organometallic compound containing no oxygen, halogen, and phosphorus and a hydrogen gas or a gas containing Si. Thin film forming method. |