http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06125092-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B41-30
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115
filingDate 1992-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9eb2634a6057fb11109d385ac44dd30f
publicationDate 1994-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H06125092-A
titleOfInvention Semiconductor memory device and manufacturing method thereof
abstract (57) [Summary] [Object] To provide a semiconductor memory device having a source region capable of obtaining stable erase characteristics, and a manufacturing method thereof. [Constitution] At least the surface of the source region 2 near the end of the floating gate 5 is covered with a floating gate. It is a flat surface having the same height as the surface of the semiconductor substrate 1 underneath. Therefore, in the step of etching the field oxide film performed when the source region 2 is formed by the self-alignment method, the region where the source region is to be formed is previously formed. An etching resistant conductive film is selectively grown, or an insulating film is formed on at least the side wall of the stacked gates facing the source formation planned region.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0680080-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0680080-A2
priorityDate 1992-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426099809
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6338112
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID36722
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454180627
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450502002
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID36722
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25516
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23932
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410510985
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419405613
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3017066
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID140819

Total number of triples: 30.