| abstract |
(57) [Summary] [Structure] For a negative chemically amplified resist containing (A) an alkali-soluble resin, (B) a cross-linking agent, and (C) an acid generator, (D) contains three or more each. A negative-type radiation-sensitive resist composition containing at least one compound selected from benzene, naphthalene, and 9,10-anthraquinone having a hydroxyl group. [Effect] It is possible to obtain a rectangular resist pattern having high resolution and high sensitivity, a small amount of dimensional change of the resist pattern with respect to a change of the irradiation amount of radiation, and a good cross-sectional shape. |