| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_630b360599ea5cf4b5bcbc0c6c0a3e2d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1992-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3350d69c40ab05153bda15263abefe7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bbbcbd53fe5f0e5f094684b17370fac |
| publicationDate |
1994-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H06118646-A |
| titleOfInvention |
Negative photosensitive composition |
| abstract |
(57) [Summary] A negative photosensitive composition containing an alkali-soluble resin, a cross-linking agent that acts on the alkali-soluble resin under acidic conditions, and an acid generator, wherein the alkali-soluble resin has a temperature of 75 ° C or higher. A negative photosensitive composition, which is a novolac resin having a glass transition temperature. [Effect] The negative photosensitive composition of the present invention is capable of half-micron lithography with ultraviolet light. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6399275-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6190833-B1 |
| priorityDate |
1992-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |