| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1991-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate |
1994-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H0611837-A |
| titleOfInvention |
Photosensitive composition |
| abstract |
(57) [Summary] (Modified) [Constitution] Polysiloxane compound of the following formula and 2-nitrobenzyl ester or sulfonate compound, or 2- Alternatively, a positive photosensitive composition containing a 3-alkoxybenzyl ester or a sulfonate compound. (N is an integer of 1 or more) [Effect] Aqueous alkaline development is possible and Deep-UV It excels in suitability for the light source in the area and in oxygen plasma resistance. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007121522-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4627030-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7169869-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6946235-B2 |
| priorityDate |
1991-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |