http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06107617-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_758994071efb42b565fc2c04637be131 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C247-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 |
| filingDate | 1992-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69ba33bd7cf37a5746306747d499ad4a |
| publicationDate | 1994-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H06107617-A |
| titleOfInvention | Addition polymerization type monomer containing azide group |
| abstract | (57) [Summary] [Structure] Formula [Chemical Formula 1] An addition polymerization type monomer containing an azide group represented by. [Effect] The compound of the present invention is homopolymerized or copolymerized with an ordinary addition-polymerization type monomer to give 300 It is possible to obtain a photosensitive resin having an ultraviolet light-sensitive area of not less than nm. With this photosensitive resin, it is possible to use an industrially inexpensive emulsion-coated photomask or soda glass-made photomask that transmits light in the wavelength range. Therefore, the compound of the present invention is useful as a raw material for a photosensitive resin. |
| priorityDate | 1992-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.