http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0594011-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1991-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4eb526dd1ede469835cc80c2e01abf2 |
| publicationDate | 1993-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0594011-A |
| titleOfInvention | Positive photoresist composition |
| abstract | (57) [Abstract] [Purpose] A resist pattern with high sensitivity and extremely excellent dimensional stability can be formed in order to respond to the rapid miniaturization of processing dimensions in the field of semiconductor device manufacturing. A positive photoresist composition, that is, a positive photoresist composition capable of forming a resist pattern which has a high effect of preventing halation and therefore has a high resolution without the resist performance being deteriorated by prebaking conditions. provide. A positive photoresist composition comprises an alkali-soluble resin, a compound containing a 1,2-naphthoquinonediazide group, and at least one compound represented by the following general formula (I) in a total solid content of 0.1. -10 wt% is included. [Chemical 1] Here, R 1 to R 14 may be the same or different and each is a hydrogen atom, a hydroxyl group, a halogen atom, a carboxyl group, a nitro group, an alkyl group, an alkoxy group, a di (alkyl) amino group, or a monovalent organic residue. And at least one of R 3 and R 8 represents a hydroxyl group. |
| priorityDate | 1991-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 202.