http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0587747-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78e55f376028937200b6696f8485227c
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N23-20
filingDate 1991-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33777102807d5122591d52319e46b829
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_803a760eeaedf97650e9998707322964
publicationDate 1993-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0587747-A
titleOfInvention Energy dispersive total reflection in-plane thin film X-ray diffraction method
abstract (57) [Summary] [Object] The present invention is an X-ray crystal structure analysis method for a thin film, wherein X-ray scattering from the substrate is caused by the total reflection effect at the boundary between the thin film and the substrate. By suppressing the line as much as possible, it became possible to evaluate the in-plane structure of the ultrathin film by improving the S / N ratio. An energy dispersive X-ray diffractometer with a fixed optical system can be incorporated into a vacuum device or the like. Construction The main parts of the device are shown in FIG. White X Source, triaxial slit system consisting of total reflection angle setting slit and incident angle setting solar slit, substrate rotating mechanism, The solid X-ray detector is the main structure.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0578387-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5285934-A
priorityDate 1991-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 19.