http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0580510-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate | 1991-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9a9c6e97fd3b3aae45011ddefb96dfc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4077e5d22eb97463be8b2b82addf97b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382467da16a04499449ed13f6cf6485b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_665afa016a6ca2f280599408e65045a1 |
| publicationDate | 1993-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0580510-A |
| titleOfInvention | Image forming material and image forming method using the same |
| abstract | (57) [Summary] (Modified) [Purpose] By developing with two kinds of alkaline aqueous solutions having different PH, it is possible to form an image in two or more steps, especially for producing multicolored images such as color filters. And an image forming method using the same. [Structure] At least a support, a first photosensitive resin composition layer developable with an alkaline aqueous solution (hereinafter referred to as "strong alkaline development type photosensitive layer"), weaker than the first photosensitive resin composition layer. An image forming material comprising a second photosensitive resin composition layer developable with an alkaline aqueous solution (hereinafter, referred to as “weak alkaline developing type photosensitive layer”), and an image forming method using the same. The strong alkaline development type photosensitive layer comprises a photosensitive resin composition containing a polymer compound having an acid group of pKa 9 to 13 and an acid value of 70 to 150, and the second photosensitive resin composition. Material layer is pKa3 It consists of a photosensitive resin composition containing a polymer compound having an acidic group of 8 to 8 and an acid value of 50 to 250. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102681346-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008181016-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008256755-A |
| priorityDate | 1991-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 267.