http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0580503-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate | 1992-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6dc2f136bdb247a13c226ff4273b88f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dcaa8ef7c12cd38f773d6363f210972 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a0597555cc5c5509dacec661f88ad76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382467da16a04499449ed13f6cf6485b |
| publicationDate | 1993-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0580503-A |
| titleOfInvention | Photosensitive transfer material and image forming method |
| abstract | (57) [Abstract] [Purpose] When a photosensitive resin layer of a photosensitive transfer material is transferred from a temporary support to a permanent support, transfer defects due to minute dust, air bubbles, steps of the permanent support, etc. may occur. Photosensitive transfer material having a layer structure that can be transferred without the use of the material, exhibits excellent releasability as a temporary support, and at the same time enables exposure in air, and image formation by a transfer method using the material. Provide a way. [Structure] A photosensitive transfer material is such that an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer are provided in this order on a temporary support, and between the thermoplastic resin layer and the temporary support. It has a structure with the smallest adhesive force, and using this photosensitive transfer material, While at least heating the photosensitive resin layer and the permanent support, After adhering under pressure as necessary, peeling is carried out at the interface between the temporary support and the thermoplastic resin layer, and the photosensitive resin layer is subjected to pattern exposure through the thermoplastic resin layer and the intermediate layer, and development. Then, an image is formed on the permanent support. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6919151-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05173320-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014074764-A |
| priorityDate | 1991-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.