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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-52
filingDate 1992-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aac81052c4a197dea89e0a3136d0f36d
publicationDate 1993-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0576874-A
titleOfInvention Method for neutralizing alkaline solutions of organic resins
abstract (57) [Abstract] [Purpose] Treatment and disposal of acidic photoresist resin. The method consists essentially of introducing a mixture of water-soluble salts of aluminum and magnesium into an alkaline solution, whereby the insoluble hydroxide and the resin are coprecipitated and the precipitate is separated from said aqueous solution. , A method for precipitating an organic resin from an aqueous alkaline solution of the resin.
priorityDate 1991-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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