| abstract |
(57) [Summary] [Structure] In a negative photosensitive composition containing a diazonium compound and a polymer compound, at least one functional group represented by the following general formula (I) is further linked to the particle surface by a chemical bond. A photosensitive composition comprising the surface-modified silica fine particles described above. (In the formula, R is a divalent linking group A 1 or A 2 composed of two or more kinds of atoms selected from C, H, N, O, S, and Si is O or S, Q 1 , Q 3 , and Q. 4 represents H or a C 1 to C 15 hydrocarbon group which may have a substituent, Q 2 represents a C 1 to C 15 hydrocarbon group which may have a substituent, and Q 2 represents A C 1 to C 15 hydrocarbon group which may have a substituent is shown, and Y is as follows.) [Effect] There is provided a photosensitive composition which is excellent in sensitivity during exposure and can be sufficiently cured even in a short exposure time. When used in a photosensitive lithographic printing plate, the image area obtained after exposure and development has a high film strength and is excellent in abrasion resistance, and the work efficiency, cost, etc. of lithographic printing plate production are significantly improved. |