http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0565658-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fb2edb0f237a90d982f2dce09ad61976 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-36 |
filingDate | 1991-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0568e217ced8191878ea4fe777a6db9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42e1709cc3ee412230ae132289bb5851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3013e982379da8655cd37c6a667af44c |
publicationDate | 1993-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0565658-A |
titleOfInvention | Electroless nickel plating solution |
abstract | (57) [Abstract] [PROBLEMS] To provide an electroless nickel plating solution capable of producing an electroless nickel alloy film having high-temperature heat-resistant non-magnetic properties without decreasing the deposition rate of the nickel alloy film. [Constitution] Nickel salt as a metal ion, malic acid as a complexing agent, hypophosphite as a reducing agent, the concentration of nickel ion is 1.5 to 4.5 g / L, and the molar ratio of malic acid / nickel is An electroless nickel plating solution having a ratio of 3.0 to 5.0. |
priorityDate | 1991-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.