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filingDate 1991-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8b3c214147ac6fb994b409fa63f033a
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publicationDate 1993-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0562778-A
titleOfInvention Thin film electroluminescent device
abstract (57) [Summary] [Structure] In a double-insulation thin-film EL element, the light-emitting layer is formed by a sputtering deposition method or the like at a substrate temperature of 150 ° C. or lower, and an amorphous thin film is sulfided with hydrogen sulfide or the like. It is manufactured by heat-treating at a temperature of 650 ° C. or higher in a volatile gas atmosphere. [Effect] Since a highly crystallized light emitting layer having a large crystal grain size can be obtained, a thin film EL element that emits light with high brightness can be manufactured.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010084698-A1
priorityDate 1991-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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