http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0561192-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1991-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4eb526dd1ede469835cc80c2e01abf2 |
| publicationDate | 1993-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0561192-A |
| titleOfInvention | Positive photoresist composition |
| abstract | (57) [Summary] [Structure] The positive photoresist composition of the present invention comprises an alkali-soluble resin and a quinonediazide compound, It is characterized by containing at least one compound represented by the following general formula. [Chemical 3] In the formula, R 1 : hydrogen atom, alkyl group, aryl group, X: Single bond, an alkylene group having 1 to 2 carbon atoms, R 2: an alkyl group, an alkoxy group, a hydrogen atom, a hydroxyl group, a carboxyl group, a halogen atom, n: 1 to 5 integer EFFECT positive photoresist of the present invention It is excellent in resolution, sensitivity, developability, heat resistance and resist shape, and is suitable for use as a photoresist for fine processing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8487009-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013041156-A |
| priorityDate | 1991-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 249.