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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-026
filingDate 1991-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7dae74ae35d4bd81837c0d6818226100
publicationDate 1993-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0555693-A
titleOfInvention Optical functional element and method for manufacturing optical functional element
abstract (57) [Summary] (Modified) [Configuration] A mask made of SiO 2 or the like is formed on the n-GaAs substrate 101. Next, a II-VI group compound semiconductor 103 such as ZnSSe is selectively grown. Then, n-GaAs A group II element such as Zn is selectively diffused in the substrate to obtain an optical functional element in which the p-region 106 is formed in the vicinity of the group II-VI compound semiconductor. [Effect] Since the electrode separated from the substrate is obtained by self-alignment, a precise pattern can be created with good reproducibility, and high integration is facilitated. Further, since it is not necessary to use a metal for the electrodes, characteristic deterioration due to variations in the equivalent refractive index does not occur.
priorityDate 1991-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 21.