http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0551756-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b0120933550ea729b9f3186c3772531b |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 |
| filingDate | 1991-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dc4e71d810be7865328d632981303443 |
| publicationDate | 1993-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H0551756-A |
| titleOfInvention | Electroless Ni-P plating method |
| abstract | (57) [Abstract] [Purpose] An object of the present invention is to provide an electroless Ni-P plating method capable of obtaining a plating film without nodules. [Structure] That is, the present invention provides a degreasing process, an acid etching process, a nitric acid dipping process, a first zinc replacement process, a zinc nitrate stripping process, a second zinc replacement process, and an electroless Ni-P process. An electroless Ni-P plating method comprising plating, the acidic etching step, the first zinc replacement step, The cleaning in at least one of the second zinc substitution step is performed by using high frequency ultrasonic waves having an oscillation frequency of 800 to 1200 kHz. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100715635-B1 |
| priorityDate | 1991-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.