http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0547615-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f7f61e7e478cafb70907a24ac92903c8 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
filingDate | 1991-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_997b05d27e09475ec6c83496186ab2c3 |
publicationDate | 1993-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H0547615-A |
titleOfInvention | Semiconductor wafer |
abstract | (57) [Abstract] [Purpose] It is intended to provide a semiconductor wafer having a structure capable of being heat-treated without causing film formation defects or thermal strain. [Structure] A through hole is provided in the central portion. |
priorityDate | 1991-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.