http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0540334-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D3-00
filingDate 1991-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_529d9a4e457dd62853f2add3f53e0c79
publicationDate 1993-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H0540334-A
titleOfInvention Method for preventing water marks on a photosensitive material processing device
abstract (57) [Summary] [Purpose] Prevents the formation of water marks in the preliminary washing tank and the washing tank. [Structure] A photosensitive material processing apparatus 1A includes a processing section in which a developing tank 2, a fixing tank 3 and a washing tank 4 are arranged in parallel, and a squeeze section 6 And a drying unit 5 including a dryer 7. Between the developing tank 2 and the fixing tank 3, between the fixing tank 3 and the washing tank 4, and between the washing tank 4 and the drying section 5, a pair of upper and lower crossover rollers 8a to 8c and a preliminary washing tank are respectively provided. 9a-9c A preliminary washing means consisting of and is installed. When the processing of the light-sensitive material S is suspended for a long time, the valve 16 is opened, the washing water in the washing tank 4 is discharged through the drain pipe 15, and the valves 14a to 14c are opened to store the preliminary washing tanks 9a to 9c. Of the washing water is introduced into the washing tank 4 through the drain pipes 13a to 13c, and further, the washing tank 4 is passed through the drain pipe 15. Discharge to the outside.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5581322-A
priorityDate 1991-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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