http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05341525-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7a0d719f2cd27b18e38a1060c2e48f88 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 |
| filingDate | 1992-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_997dc1b8b12ceef335372136a0af922a |
| publicationDate | 1993-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05341525-A |
| titleOfInvention | Photosensitive composition |
| abstract | (57) [Summary] [Object] An object of the present invention is to provide a photosensitive composition which can be developed by an aqueous alkaline solution containing no organic solvent and which is excellent in developing ability and adhesion to a support. To do. A gist of the present invention is to provide a photosensitive composition containing a compound capable of generating an acid upon irradiation with an radiation and an alkali-soluble copolymer, wherein the alkali-soluble copolymer is p- A photosensitive composition characterized by using a copolymer comprising 10 to 40% by weight of isopropenylphenol, 50 to 80% by weight of glycidyl methacrylate, and 0 to 10% by weight of acrylic acid and / or methacrylic acid. |
| priorityDate | 1992-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 191.