http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05341514-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1992-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4eb526dd1ede469835cc80c2e01abf2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 |
| publicationDate | 1993-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05341514-A |
| titleOfInvention | Positive photoresist composition |
| abstract | (57) [Summary] [Structure] The positive photoresist composition of the present invention comprises a polyhydroxy compound represented by the following general formula (1): 2-naphthoquinonediazide-5- (and / or -4-) It contains a sulfonic acid ester and an alkali-soluble resin. [Chemical 1] In the formula, R represents a monovalent or divalent organic group. R 1 to R 4 May be the same or different and each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group. n represents a number corresponding to a bond of the organic group R and is 1 or 2. [Effect] The positive photoresist containing the photosensitive material of the present invention is excellent in resolution, sensitivity, developability, and heat resistance, and is preferably used as a photoresist for microfabrication. |
| priorityDate | 1992-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 199.