http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05313366-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1992-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d1a0527009e3d4221e730ccf8a30ffa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 |
| publicationDate | 1993-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05313366-A |
| titleOfInvention | Method for producing high-purity positive photosensitive film forming liquid |
| abstract | (57) [Summary] [Structure] An alkali-soluble resin and a quinonediazide group-containing compound were dissolved in a solvent consisting mainly of a water-insoluble ketone solvent, and then this solution was mixed with an acid aqueous solution and left standing to form. A high-purity positive photosensitive film forming liquid is obtained by separating the non-aqueous layer from the two layers. [Effect] The high-purity positive-type photosensitive film forming liquid contains almost no metal, the amount of metal remaining on the substrate is reduced, the lifetime and the electrical characteristics are suppressed from being deteriorated, and the resist pattern has a good yield. Can be formed. |
| priorityDate | 1992-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 105.