http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05306464-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c6191997ed6dda6a5a3582e10b0b3dbc |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 1992-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d035c86a4f33d40e261d1ceecc21fa58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51da56de33ae60c831bf43537042c948 |
| publicationDate | 1993-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05306464-A |
| titleOfInvention | Photo-excited chemical vapor deposition equipment |
| abstract | (57) [Abstract] [Purpose] In a photo-excited chemical vapor deposition apparatus, the property of a thin film does not depend on the irradiation time of light by adopting a structure in which a gas is uniformly blown over the entire optical window. [Configuration] Ring-shaped groove (1) on the inner wall surface of the optical window (3) By providing the ring-shaped gas blowing hole (2), the photo-excited chemical vapor deposition apparatus has a structure in which the gas is uniformly blown over the entire optical window. |
| priorityDate | 1992-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID224478 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412483216 |
Total number of triples: 15.