http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05291190-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate | 1992-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06da74953c8f52589ae2be77b6e67a36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4435691eb229a0b4f569a8b55d9d1a32 |
| publicationDate | 1993-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05291190-A |
| titleOfInvention | Plasma equipment |
| abstract | (57) [Summary] [Object] To provide a plasma device capable of generating high-density plasma with less risk of sputtering or metal contamination of an object to be processed. A helicon wave plasma is generated by applying a high frequency to an antenna having a predetermined shape on a dielectric without using a plasma generating electrode. Electrons are extracted from the helicon wave plasma by an accelerating electrode and accelerated, and introduced into a reaction chamber to which a reactive gas is supplied. In the reaction chamber, plasma of the reactive gas is generated by the accelerated electrons, and the object to be processed is subjected to a predetermined process. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100644181-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008100642-A3 |
| priorityDate | 1992-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID2244 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556224 |
Total number of triples: 17.