http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05287664-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_14b02369b953bf4ebd31190c8cb63473 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/D06B19-00 |
| filingDate | 1992-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e6d180a855edd0ba9074481dc82810c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d43f453d35f35385f8dca6155355774c |
| publicationDate | 1993-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05287664-A |
| titleOfInvention | Low temperature plasma processing equipment |
| abstract | (57) [Summary] (Modified) [Purpose] Low cost and simple low temperature that allows gas to fill the entire space between a pair of electrode plates without installing an exhaust duct or a cover to prevent gas scattering. To provide a plasma device. In a low-temperature plasma apparatus, one of a pair of electrode plates made of metal plates, which are separated from each other so as to sandwich the material to be processed to be transferred, in a reactor that can hold vacuum and continuously transfer the material to be processed. Gas inlet pipe at the end of the electrode (1) is provided, and a mechanism for supplying gas between the electrode plates is provided. |
| priorityDate | 1992-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.