http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05279873-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 |
| filingDate | 1992-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1993-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05279873-A |
| titleOfInvention | Micro processing method |
| abstract | (57) [Summary] [Object] To provide a method for easily forming a fine pattern directly on a surface of a work piece having unevenness. [Constitution] In a container 2 filled with a solution 1, a work piece 3, The reference electrode 4 and the counter electrode 5 having a fine tip are immersed, and the distance between the counter electrode and the sample is made as small as possible to form an electrochemical reaction field only in the vicinity of the tip of the counter electrode. A pattern 8 having a different resistance to the etching liquid is electrochemically formed, and then the workpiece is processed with the etching liquid 9 in accordance with the formed pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6454987-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6379773-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4562801-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6221228-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2008140058-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012144791-A |
| priorityDate | 1992-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.