http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05257273-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1992-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1993-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H05257273-A |
| titleOfInvention | Positive photoresist composition |
| abstract | (57) [Summary] [Constitution] The positive photoresist composition of the present invention comprises an alkali-soluble resin, a quinonediazite compound and an acid imide group-containing compound. [Effect] The positive photoresist of the present invention is excellent in resolution, sensitivity, developability and heat resistance, and is suitably used as a photoresist for fine processing. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018150771-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010053070-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2018150771-A1 |
| priorityDate | 1992-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 380.