| abstract |
(57) Abstract: A dry developable surface imageable photoresist composition and a method for producing a positive tone resist image on a substrate thereby. The photoresist composition comprises a film-forming aromatic polymer resin activated for electrophilic substitution, an acid-catalytic cross-linking agent capable of introducing an aromatic ring into the aromatic polymer resin, and It is formed by mixing a radiation-decomposable acid generating compound. |