http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H05232696-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
filingDate | 1992-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37675c9cdf5a5f61152f344bd5916539 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e6a42ed6be3f395cd4243cc3f71ba44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_370a4a488a6dbde066a6710355ac2419 |
publicationDate | 1993-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H05232696-A |
titleOfInvention | Positive resist composition |
abstract | (57) [Abstract] [Purpose] To provide a positive resist composition having an excellent balance of various properties such as sensitivity and heat resistance. [Structure] The following general formula (I): (In the formula, R 1 , R 2 and R 3 each independently represent a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms, and k represents 1 or 2). Alternatively, two or more kinds of the following general formula (II): (In the formula, Y 1 to Y 6 represent a hydrogen atom or an alkyl or alkoxy group having 1 to 4 carbon atoms, and Y 7 is a divalent, optionally substituted ethylene hydrocarbon residue having 3 to 10 carbon atoms. Group, and 1 and 2 each represent 1 or 2) and an alkali-soluble resin containing a resin (A) obtained by condensing an aldehyde and a quinonediazide compound. A positive resist composition comprising |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016010124-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016010124-A1 |
priorityDate | 1992-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 221.